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— | Compared to competitors’ multi-layered plated films, manufacturing method using minimum layer sputtering method secures unit price competitiveness |
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— | Improvement of quality reliability due to decrease of defect factors such as void delamination at Cu/Sn interface |
— | Future market response and application scalability with granular size PCSB (minimum size >4um) versus competitive PCSB |
R to R Sputter — Equipment to attract metallic/non metallic objects into film surfaces in vacuum chambers — Performance is given to
Basic Configuration of Sputter (1Chamber) — Sputtering Chamber + Carrier L/UL(Vacuum/Standby) + Baking Chamber + Cassette L/UL 01. Cassette L/UL02. Carrier L/UL